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1 - 10 of 356 Search Results for 193 nm laser

1pdf document  ExcimerLasersforSuper-HighNA193nmLithographyRev2 Best match in this PDF  |  All matches in this PDF
….8 which determines the output spectrum of the laser to be less than 0.30 pm FWHM. In this paper we report on our recent progress in the development of high repetition rate ultra-narrow band lasers for high NA 193 nm microlithography scanners. The laser, NovaLine A4003, is based on a Single Oscillator…
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2AppliedPhysicsRev2.pdf  (PAGE 4 OF 5)
laser pulses,
it has to be checked that there is a nonlinear power-dependent
contribution to the fiber attenuation. The nonlinear attenuation becomes important for 266 nm and dominant for 248
and 193 nm lasers even at comparatively low intensities [17,
23]. To convert the laser

3pdf document  ComparisonExcimerLaserSolidStateLaserRev2 Best match in this PDF  |  All matches in this PDF
…state lasers are summarized in Table 1. Table 1: Excimer performance characteristics Characteristic Excimer Laser Photon Energy Diode pumped ND:YAG Wavelength 351 nm, 308 nm, 248 nm, 193 nm, 157 nm 1.17 eV 2.33 eV 3.53 eV 4.02 eV 4-66 eV 5.00 eV 6.42 eV 7.90 eV 1064 nm, 532 nm, 355 nm 266 nm Energy…
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4pdf document  ExcimerProductGuide2011 Best match in this PDF  |  All matches in this PDF
…200 20/100 COMPexPro 200 193 400 10/50 248 700 10/50 307 500 10/50 351 300 10/50 Laser Selection Guide Excimer Lasers 1 Max. energy (mJ) is stabilized energy. 4 LaserSelectionGuide Superior Reliability & Performance · www.Coherent.com · tech.sales@coherent.com Wavelength (nm) Max. Energy (mJ) Max. Repetition…
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5pdf document  pdf 127 Best match in this PDF  |  All matches in this PDF
…spectrometer equipped with a 266-nm laser system from Cetac Technologies and, simultaneously, a GeoLas optical system from MicroLas, based on a 193-nm COMPex 110 laser from Lambda Physik. The beams of both lasers had flat-top intensity profiles, in the case of the 193 nm laser provided by a crossed lens array…
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6Microsoft Word - GlobablSemiArt.doc  (PAGE 2 OF 2)
laser characteristics to meet the specific needs of the roadmap.
Lasers in the ITRS
1st Year of Production
Technology Node
Application
2004
90 nm
2007
65 nm
2010
45 nm
Lithography
Excimer: 248 nm
Excimer: 193 nm
Excimer: 193 nm

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7pdf document  pdf 129 Best match in this PDF  |  All matches in this PDF
laser radiation ( = 248 nm) is very suitable for the structuring of engineering ceramics, and a great variety of polymers as well. The use of ArF lasers at a wavelength of = 193 nm allows glass processing, with a surface quality close to that of optics. Despite these technological advantages of 193 nm
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8pdf document  SemiManufMagRev2 Best match in this PDF  |  All matches in this PDF
…CCD detectors with high sensitivity at 193 nm are readily available. Until recently, there was no laser that fulfilled all these criteria. Consequently, stepper lens interferometry has typically been performed using longer wavelength lasers or with excimer lasers specially modified to deliver increased…
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9pdf document  ExcimersPushMachingLimitsforResolutionRev2 Best match in this PDF  |  All matches in this PDF
…xcimer lasers emitting at 351, 308, 248 and 193 nm are well-established industrial tools both in microlithography and high-precision laser material processing. Because of their unique physical properties that provide an essential advantage in both of these fields of application, fluorine (F2) laser sources…
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10pdf document  EnergyMaxSensors UserManual RevAB Best match in this PDF  |  All matches in this PDF
…measurement non-linearity). Description 15 MaxUV EnergyMax Sensors These sensors are specifically optimized for use with ArF lasers operating at 193 nm and KrF lasers operating at 248 nm, and feature high accuracy and large active areas (up to 50 mm). The EnergyMax series utilizes a unique coating--called…
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