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193 nm solid state

compatibility matrix 02

compatibility matrix 02

…2014) 355 nm FieldMaxII-TO PM30X
Flare 355, 532, 1064 nm LabMax-TOP J-10MB-HE
Helios 532, 1064 nm FieldMaxII-TO PM10
HYPER RAPID 25 355, 532, 1064 nm FieldMaxII-TO PM30
HYPER RAPID 50 355, 532, 1064 nm FieldMaxII-TO PM150
Indigo-DUV (discontinued 2010) 193 nm FieldMaxII-TO…

Conference FBG Cohr in Goe 0916.pdf

Conference FBG Cohr in Goe 0916.pdf

…homogeneity as solely provided by a seamless corona type preionization. 2.2 Solid state pulsed circuit To provide the high pump energy densities in a short time interval as required for population inversion, 193 nm excimer lasers are discharge pumped using a high-voltage capacitor circuit (pulser)…

CMM 11.3.indd

CMM 11.3.indd

…in the costs of acquisition and operation afforded by the latest generation of 193 nm excimer laser, such as the Coherent ExciStar (figure 1)--there is cost parity with longer wavelength CO 2 and diode-pumped solid state (DPSS) laser-based solutions, as well as superior quality and throughput of the…

COHR MaterialsProcessingBrochure 0816revA 3.pdf

COHR MaterialsProcessingBrochure 0816revA 3.pdf

…micromachining applications.
Excimer Lasers:
Excimer lasers are pulsed (ns) gas lasers that emit, UV wavelengths
such as 193 nm, 248 nm and 308 nm, depending on which specific
gas mixture is operated in the laser. Coherent's few-Watt ExciStar
laser is used in glass marking…

07(IK14-10)p.53-57.fm

07(IK14-10)p.53-57.fm

…type of ultraviolet
laser such as a diode pumped solid state (DPSS). At a given
parameter set for laser fluence, pulse frequency and field
Fig. 6. Via depth and depth per pulse in four different glass types
measured at 193 nm and 7 J/cm2.
Fig. 7. 10 µm diameter vias drilled…

2009 LMCCatalog86.pdf

2009 LMCCatalog86.pdf

…FieldMaxII-TO PM30 Verdi IR 1064 FieldMaxII-TO PM30 Laser Wavelength (nm) Power Meter Power Sensor Energy Meter Energy Sensor AVIA (30W) 532 FieldMaxII-TO PM150 - - Indigo-DUV 193 FieldMaxII-TO PS10 3sigma J-10MT-10KHZ Indigo-S 193 to 900 FieldMaxII-TO PS10 3sigma J-10MT-10KHZ MATRIX 1064 1064…

USP Lasers Semiconductor Packaging Whitepaper.pdf

USP Lasers Semiconductor Packaging Whitepaper.pdf

…and USP lasers with the requisite output power for these
singulation applications. The 40W Coherent AVIA NX is a nanosecond pulsewidth, UV solid- state
laser that is already widely employed for semiconductor package cutting. Coherent also offers
higher power AVIA NX lasers than this…

Whitepaper - USP Lasers Deliver Cleaner Cuts for Semiconductor Packaging.pdf

Whitepaper - USP Lasers Deliver Cleaner Cuts for Semiconductor Packaging.pdf

…and USP lasers with the requisite output power for these
singulation applications. The 40W Coherent AVIA NX is a nanosecond pulsewidth, UV solid- state
laser that is already widely employed for semiconductor package cutting. Coherent also offers
higher power AVIA NX lasers than this…

Laser Focus World - November 2017

Laser Focus World - November 2017

…high-precision, compact, tabletop lasers deployed worldwide at eye clinics and LASIK centers. In the LASIK procedure, excimer laser pulses at 193 nm are used to ablate material from the human cornea to reshape it, thus changing its refractive power and allowing correction for short- or…

CMM 8.2.indd

CMM 8.2.indd

…section of the through
glass vias. A more thermal process would
cause the glass to fracture. Using an excimer
laser wavelength of 193 nm at higher fluences
(several Joules per square centimeter)
could extend this same method down to via
diameters of 10 µm.

Untitled-2

Untitled-2

…lasers
with the requisite output power for these singulation
applications. The 40W Coherent AVIA NX is a nanosecond
pulsewidth, UV solid- state laser that is already widely
employed for semiconductor package cutting. Coherent
also offers higher power AVIA NX lasers than this…

Lasers | Photonics Handbook®

Lasers | Photonics Handbook®

…can produce several discrete wavelengths throughout the UV; depending on the gas
combination, emission ranges from 157 to 348 nm. The deep-UV line at 193 nm is the most widely used source for lithography processes in the semiconductor
industry. The 308-nm wavelength is used for annealing…

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