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1 - 12 of 87 Products for '248nm Laser' Page 1 of 8 |
Related Categories: Ldp | Glass Ablation

248nm Laser

Industrial Laser Solutions - September/October 2015

Industrial Laser Solutions - September/October 2015

…with either 308 or 248nm excimer lasers, allowing it to be matched to the absorption characteristics of the particular materials in use. The high pulse energy (over 1J) and repetition rate (300Hz) provide rapid throughput of feature sizes down to 3µm. In addition, excimer laser ablation provides…

Microsoft Word - e-newsletter Whitepaper FBG Writing rev3.docx

Microsoft Word - e-newsletter Whitepaper FBG Writing rev3.docx

…248nm-excimer laser model. Process of simultaneously drawing the fiber and writing the grating prior to coating (Source: FBGS International) Figure 10 Based on a Talbot interferometer as indicated in figure 10, a grating is written on the fly within a single excimer laser pulse at high fluence.…

Why Choose a PLD Excimer Laser from Lambda Physik

Why Choose a PLD Excimer Laser from Lambda Physik

Fig.6) Pulse shape (blue curve) and energy integral over time (green curve) of a CompexPro100 laser at 248nm.

Industrial Laser Solutions - September/October 2015

Industrial Laser Solutions - September/October 2015

…with either 308 or 248nm excimer lasers, allowing it to be matched to the absorption characteristics of the particular materials in use. The high pulse energy (over 1J) and repetition rate (300Hz) provide rapid throughput of feature sizes down to 3µm. In addition, excimer laser ablation provides…

Industrial Laser Solutions - September/October 2015

Industrial Laser Solutions - September/October 2015

…with either 308 or 248nm excimer lasers, allowing it to be matched to the absorption characteristics of the particular materials in use. The high pulse energy (over 1J) and repetition rate (300Hz) provide rapid throughput of feature sizes down to 3µm. In addition, excimer laser ablation provides…

Why Choose a PLD Excimer Laser from Lambda Physik

Why Choose a PLD Excimer Laser from Lambda Physik

Fig.1) Energy stability of COMPexPro100 at 248nm, 10Hz. Energy Stability of COMPexPro100, 248nm, 10Hz 0 0,5 1 1,5 2 2,5 3 19 20 21 22 23 24 25 26 27 28 29 30 Discharge Voltage [kV] EnergyStability[%,sigma]

Why Choose a PLD Excimer Laser from Lambda Physik

Why Choose a PLD Excimer Laser from Lambda Physik

Fig.4) Dynamic energy range of COMPexPro100 version at 248nm, 10Hz. Dynamic Energy Range of COMPexPro100, 248nm, 10Hz 0 100 200 300 400 500 600 19 20 21 22 23 24 25 26 27 28 29 30 Discharge Voltage [kV] Energy[mJ]

UV Lasers Enable Smart Phones and Other Microelectronics

UV Lasers Enable Smart Phones and Other Microelectronics

…applications requiring lasers generally, and UV lasers in particular, will develop as manufacturers seek enabling precision technology to produce the next generations of personal microelectronic devices. Receptor wafer Gallium Nitride Sapphire wafer 193nm or 248nm excimer laser photons fIgUrE 5:…

UV Lasers Enable Smart Phones and Other Microelectronics

UV Lasers Enable Smart Phones and Other Microelectronics

…applications requiring lasers generally, and UV lasers in particular, will develop as manufacturers seek enabling precision technology to produce the next generations of personal microelectronic devices. Receptor wafer Gallium Nitride Sapphire wafer 193nm or 248nm excimer laser photons fIgUrE 5:…

UV Lasers Enable Smart Phones and Other Microelectronics

UV Lasers Enable Smart Phones and Other Microelectronics

…applications requiring lasers generally, and UV lasers in particular, will develop as manufacturers seek enabling precision technology to produce the next generations of personal microelectronic devices. Receptor wafer Gallium Nitride Sapphire wafer 193nm or 248nm excimer laser photons fIgUrE 5:…

Large-Area-Laser-Lift-Off-Processing-in-Microelectronics.pdf

Large-Area-Laser-Lift-Off-Processing-in-Microelectronics.pdf

…has to be provided to decompose the GaN into metallic gallium. Due to these requirements, the excimer laser, especially the KrF excimer laser operating at 248 nm, is the first choice for LLO. 248nm line sapphire wafer separation The figure below is a white light interferometry image of a gallium…

Microsoft Word - 014 ThinFilmProcessing LPM2010

Microsoft Word - 014 ThinFilmProcessing LPM2010

…in an epitaxially manner on sapphire with 248nm excimer laser light which is subsequentially directed through the sapphire substrate, which itself is transparent at UV excimer laser wavelengths. A depicted in Figure 4, the absorption of the 248nm excimer laser photons occurs at the interface between…

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