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248nm laser

COHR ExcimerCatalog2016revC.pdf

COHR ExcimerCatalog2016revC.pdf

…tasks.Theseincludedrilling,pulsedlaserdeposition (PLD),laserdirectpatterning(LDP),laserliftoff(LLO) andcleaning. LPXpro Excimer Lasers Part No. Product Description 26083020 UnstableResonatorOptics193nm(externalresonatorconfiguration) 26083120…

Industrial Laser Solutions - September/October 2015

Industrial Laser Solutions - September/October 2015

…with either 308 or 248nm excimer lasers, allowing it to be matched to the absorption characteristics of the particular materials in use. The high pulse energy (over 1J) and repetition rate (300Hz) provide rapid throughput of feature sizes down to 3µm. In addition, excimer laser ablation provides…

Industrial Laser Solutions - September/October 2015

Industrial Laser Solutions - September/October 2015

…with either 308 or 248nm excimer lasers, allowing it to be matched to the absorption characteristics of the particular materials in use. The high pulse energy (over 1J) and repetition rate (300Hz) provide rapid throughput of feature sizes down to 3µm. In addition, excimer laser ablation provides…

Industrial Laser Solutions - September/October 2015

Industrial Laser Solutions - September/October 2015

…with either 308 or 248nm excimer lasers, allowing it to be matched to the absorption characteristics of the particular materials in use. The high pulse energy (over 1J) and repetition rate (300Hz) provide rapid throughput of feature sizes down to 3µm. In addition, excimer laser ablation provides…

COHR ExcimerCatalog2016revC.pdf

COHR ExcimerCatalog2016revC.pdf

…tasks.Theseincludedrilling,pulsedlaserdeposition (PLD),laserdirectpatterning(LDP),laserliftoff(LLO) andcleaning. LPXpro Excimer Lasers Part No. Product Description 26083020 UnstableResonatorOptics193nm(externalresonatorconfiguration) 26083120…

LLO WavelengthAdvantage.pdf

LLO WavelengthAdvantage.pdf

…has to be provided to decompose the GaN into metallic gallium. Due to these requirements, the excimer laser, especially the KrF excimer laser operating at 248 nm, is the first choice for LLO. 248nm line sapphire wafer separation The figure below is a white light interferometry image of a gallium…

Microsoft Word - e-newsletter Whitepaper FBG Writing rev3.docx

Microsoft Word - e-newsletter Whitepaper FBG Writing rev3.docx

…248nm-excimer laser model. Process of simultaneously drawing the fiber and writing the grating prior to coating (Source: FBGS International) Figure 10 Based on a Talbot interferometer as indicated in figure 10, a grating is written on the fly within a single excimer laser pulse at high fluence.…

Microsoft Word - e-newsletter Whitepaper FBG Writing rev3.docx

Microsoft Word - e-newsletter Whitepaper FBG Writing rev3.docx

…Phase Mask The excimer laser is by far the most powerful source of UV laser light, and so can create FBGs within seconds using the standard phase mask approach. The common method in FBG research and production is phase-mask writing using dedicated 193nm or 248nm excimer laser models with increased…

Industrial Laser Solutions - September/October 2015

Industrial Laser Solutions - September/October 2015

…with either 308 or 248nm excimer lasers, allowing it to be matched to the absorption characteristics of the particular materials in use. The high pulse energy (over 1J) and repetition rate (300Hz) provide rapid throughput of feature sizes down to 3µm. In addition, excimer laser ablation provides…

Industrial Laser Solutions - September/October 2015

Industrial Laser Solutions - September/October 2015

…with either 308 or 248nm excimer lasers, allowing it to be matched to the absorption characteristics of the particular materials in use. The high pulse energy (over 1J) and repetition rate (300Hz) provide rapid throughput of feature sizes down to 3µm. In addition, excimer laser ablation provides…

Industrial Laser Solutions - September/October 2015

Industrial Laser Solutions - September/October 2015

…with either 308 or 248nm excimer lasers, allowing it to be matched to the absorption characteristics of the particular materials in use. The high pulse energy (over 1J) and repetition rate (300Hz) provide rapid throughput of feature sizes down to 3µm. In addition, excimer laser ablation provides…

ILS Japan 2017-09 - OPE Electronics.pdf

ILS Japan 2017-09 - OPE Electronics.pdf

UV 308nm FWHMFull Width at Half Maxi mum25ns 200J/cm2 UV 350nm 308nm 248nm 1 1% UV 1 5m2 1 September 2017 Industrial Laser Solutions Japan 13

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