Search Results

Refine

Result Type

1 - 7 of 7 Products for '308nm' Page 1 of 1 |
  • 1

308nm

Lasers | Photonics Handbook®

Lasers | Photonics Handbook®

…from 157 to 348 nm. The deep-UV line at 193 nm is the most widely used source for lithography processes in the semiconductor
industry. The 308-nm wavelength is used for annealing silicon in high-performance displays. The same wavelength is also key to generating a unique long-wear
surface…

ILS Annealing.PDF

…(FIGURE 1).
In this technique, a pulsed excimer laser line beam is
scanned over the a-Si film. Silicon efficiently absorbs the
308nm excimer output. This high absorption, combined with
the high pulse energy of the excimer laser, makes it possible
to achieve near-complete…

ILS Japan 2017-09 - OPE Electronics.pdf

ILS Japan 2017-09 - OPE Electronics.pdf

UV

308nm

FWHMFull Width at Half Maxi
mum
25ns
200J/cm2

UV

350nm

308nm
248nm

1

1%

UV
1 5m2

1

September 2017 Industrial Laser Solutions Japan 13

Laser Focus World China 2018-04 Excimer Lasers %28Chinese%29.pdf

Laser Focus World China 2018-04 Excimer Lasers %28Chinese%29.pdf

AMOLED

TFT

CVD
a-Si

poly-Si

TFT

ELA

308nm

Gen 61.5m×1.8m

ELA

20

Lambda Physik
ELA

----

Photonik Feb2014.pdf

Photonik Feb2014.pdf

…of a truly flexible display
occurs only within the last process step.
Here, the line beam of an excimer laser
having a wavelength of 308nm is focused
through the carrier glass onto the polymer
film and evaporates a thin fraction of the
polymer layer most adjacent to the…

FutureElectronics June2014.pdf

FutureElectronics June2014.pdf

…large-format
excimer laser annealing process of
transforming amorphous silicon panels into high-grade LTPS panels.
Technically, a 308nm excimer laser
line beam is scanned over the substrate with the amorphous silicon layer on top, which absorbs the UV radiation. Remnant seeds…

Photonics Spectra - September 2016

Photonics Spectra - September 2016

…made of expensive quartz. Therefore, the
key enabler for low-cost, mass production
ofdisplaysusingconventionaldisplayglass
was the 308-nm excimer laser for selective low-temperature polysilicon recrystallization. The excimer laser process to
Adapting Laser Lift-Off Technique for…