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1 - 12 of 17 Products for '308nm Laser' Page 1 of 2 |

308nm Laser

Lasers | Photonics Handbook®

Lasers | Photonics Handbook®

…pulsed laser technology. They can produce several discrete wavelengths throughout the UV; depending on the gas combination, emission ranges from 157 to 348 nm. The deep-UV line at 193 nm is the most widely used source for lithography processes in the semiconductor industry. The 308-nm wavelength…

FutureElectronics June2014.pdf

FutureElectronics June2014.pdf

…groundbreaking Vyper/LineBeam technology, which enables the required large-format excimer laser annealing process of transforming amorphous silicon panels into high-grade LTPS panels. Technically, a 308nm excimer laser line beam is scanned over the substrate with the amorphous silicon layer on top,…

ILS Annealing.PDF

…annealing (FIGURE 1). In this technique, a pulsed excimer laser line beam is scanned over the a-Si film. Silicon efficiently absorbs the 308nm excimer output. This high absorption, combined with the high pulse energy of the excimer laser, makes it possible to achieve near-complete melt of the thin…

Photonics Spectra - September 2016

Photonics Spectra - September 2016

…production ofdisplaysusingconventionaldisplayglass was the 308-nm excimer laser for selective low-temperature polysilicon recrystallization. The excimer laser process to Adapting Laser Lift-Off Technique for Flexible Displays Excimer lasers optimized for high-energy pulses have applications beyond…

ILS Japan 2017-09 - OPE Electronics.pdf

ILS Japan 2017-09 - OPE Electronics.pdf

UV 308nm FWHMFull Width at Half Maxi mum25ns 200J/cm2 UV 350nm 308nm 248nm 1 1% UV 1 5m2 1 September 2017 Industrial Laser Solutions Japan 13

Lasers | Photonics Handbook®

Lasers | Photonics Handbook®

…pulsed laser technology. They can produce several discrete wavelengths throughout the UV; depending on the gas combination, emission ranges from 157 to 348 nm. The deep-UV line at 193 nm is the most widely used source for lithography processes in the semiconductor industry. The 308-nm wavelength…

Lasers | Photonics Handbook®

Lasers | Photonics Handbook®

…pulsed laser technology. They can produce several discrete wavelengths throughout the UV; depending on the gas combination, emission ranges from 157 to 348 nm. The deep-UV line at 193 nm is the most widely used source for lithography processes in the semiconductor industry. The 308-nm wavelength…

FutureElectronics June2014.pdf

FutureElectronics June2014.pdf

…groundbreaking Vyper/LineBeam technology, which enables the required large-format excimer laser annealing process of transforming amorphous silicon panels into high-grade LTPS panels. Technically, a 308nm excimer laser line beam is scanned over the substrate with the amorphous silicon layer on top,…

FutureElectronics June2014.pdf

FutureElectronics June2014.pdf

…groundbreaking Vyper/LineBeam technology, which enables the required large-format excimer laser annealing process of transforming amorphous silicon panels into high-grade LTPS panels. Technically, a 308nm excimer laser line beam is scanned over the substrate with the amorphous silicon layer on top,…

Photonics Spectra - September 2016

Photonics Spectra - September 2016

…production ofdisplaysusingconventionaldisplayglass was the 308-nm excimer laser for selective low-temperature polysilicon recrystallization. The excimer laser process to Adapting Laser Lift-Off Technique for Flexible Displays Excimer lasers optimized for high-energy pulses have applications beyond…

ILS Annealing.PDF

…annealing (FIGURE 1). In this technique, a pulsed excimer laser line beam is scanned over the a-Si film. Silicon efficiently absorbs the 308nm excimer output. This high absorption, combined with the high pulse energy of the excimer laser, makes it possible to achieve near-complete melt of the thin…

COHR ExcimerCatalog2016revC.pdf

COHR ExcimerCatalog2016revC.pdf

…tasks.Theseincludedrilling,pulsedlaserdeposition (PLD),laserdirectpatterning(LDP),laserliftoff(LLO) andcleaning. LPXpro Excimer Lasers Part No. Product Description 26083020 UnstableResonatorOptics193nm(externalresonatorconfiguration) 26083120…

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