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1.    microelectrdetectionRev2 Best match in this PDF  |  All matches in this PDF rors in mask design. Leading-edge applications include the use of confocal microscopy to detect subsurface errors, holographic inspection of high-aspect-ratio vias and thinfilm diagnostics based on photonacoustic pulses. Upstream of chip production, laser-based tools help to qualify lens materials ... Related Searches: pointing stability

2.    AdvancedUVMay2009  (PAGE 3 OF 4) RubRik www.laser-journal.de LTJ 3 2009 WiLEY-VCH Verlag GmbH & Co. kGaA, Weinheim contact with these layers. With wider streets (the blank area between individual chips), thelaserissometimesusedtocreateanarrow groove down each side of the street acting as a type of crack-stop. in these cases, the ...

3.    SemiManufMagRev2  (PAGE 3 OF 5) 44 T E C H N O L O G Y S E M I C O N D U C T O R M A N U F A C T U R I N G M A R C H 2 0 0 5 earliest implementations of this technique used either the krypton laser operating at 413 nm or the argon laser at 364 nm. Over the past few years, use of the frequency-doubled argon laser, with output at 257 ...

4.    SemiManufMagRev2  (PAGE 4 OF 5) However, an even shorter wavelength laser will probably be required to support the 65 nm node. One option currently under development uses a technique called sum-frequency mixing to produce more than 100 mW of high-quality output at 198 nm. Specifically, this approach requires mixing the output of ... Related Searches: 355 nm

5.    PhotoniquesRev2  (PAGE 2 OF 3) perpendiculairement leur empilement et non latralement. Habituellement, les VECSEL sont pomps par un courant lectrique, comme c'est le cas pour les diodes laser. Un OPSL opre diffremment puisqu'il produit l'mission laser partir d'un pompage optique produisant des puissances importantes avec une excellente ... Related Searches: azure | opsl

6.    CircuiTreeRev2  (PAGE 3 OF 4) necessary transformations, an imaging system in the LDI instrument measures the precise positions of features or fiducial marks on the panel and then uses these to calculate exactly how the pattern should be altered in order to optimize registration for that unit or batch. Typically, this includes ...

7.    SemiManufMagRev2 Best match in this PDF  |  All matches in this PDF ABSTRACT Semiconductor chip manufacturing has become increasingly dependent upon laser technology, from photomask generation through packaging. Laser manufacturers have responded to this demand with the development of products that are increasingly specialized and optimized for the needs of semiconductor ... Related Searches: 1064 nm laser | 193 nm laser | 266 nm | 355nm cw laser

8.    GlobalSemiArt2Rev2  (PAGE 1 OF 2) ... maintenance downtime and reduced cost of consumables. Photomask inspection Most current laser photomask inspection utilises the argon laser at 364nm, which supports mask inspection for the 130nm node. Detection of smaller defects requires shorter wavelengths. The frequency-doubled argon laser at 257nm ...

9.    70410-168e-ILS.UV  (PAGE 3 OF 3) ... requirements was the large frame argon ion laser. The largest of these can deliver up to 4 W of UV output, at multiple wavelengths in the 351- to 364nm range. The major drawback of the argon laser is that it necessitates a signifi cant initial investment in site preparation and is also costly to operate ... Related Searches: paladin

10.    PhotoniquesRev2 Best match in this PDF  |  All matches in this PDF Un développement inattendu Les lasers à CO2 comptent parmi les dinosaures de l'optique cohérente ! Cette technologie est souvent considérée comme figée, alors qu'elle présente en fait un potentiel significatif de développement : évidemment, le challenge n'est plus tellement de comprendre les fondamentaux ...

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