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Wafer Inspection

Microelectronics

Microelectronics

…used in two applications: in lithography tools and in inspection. There are many different inspection steps in a modern semiconductor fab and Coherent lasers are used in most of them: mask inspection, bare and patterned wafer inspection. Coherent has many years of experience building lasers for…

Azure-Brochure.pdf

Azure-Brochure.pdf

…the next generation
of inspection along the semiconductor industry
roadmap, the Azure deep-UV laser delivers. It
emits a wavelength of 266 nm, which allows
detection of smaller defects that longer wavelengths miss. This results in higher wafer yield
and better mask…

INNOVA FreD systems

INNOVA FreD systems

…Scientific Raman Spectroscopy Compact Disk and DVD Mastering Fiber Bragg Grating Inspection Laser Direct Imaging (LDI) Lithography Choose a Process Optical Disk Media Germanium-Doped Optical Fiber Patterned Semiconductor Wafer Precision Optics Reticle Photoresist Fluorescence Excitation --> Features…

Advances in Diode Lasers and OPSLs

Advances in Diode Lasers and OPSLs


range of 355 nm to 1064 nm. In addition, expansion
into the IR and UV will be accomplished by applying
different wafer materials and wafer types. For OPSLs,
UV wavelengths can also be generated very elegantly
by nonlinear optical processes (e.g., frequencydoubling).…

EU CMM Luebeck Luger Interview 0918.pdf

EU CMM Luebeck Luger Interview 0918.pdf

…fabrication is inspection of
un-patterned wafers to identify
contaminants. Our Azure and
Paladin lasers, which employ
different types of specialised UV
DPSS technology, are utilised
for this application as well as
for patterned wafer inspection.
The Azure…

Paladin Advanced 355

Paladin Advanced 355

…Advanced 355 Applications Application Process Material Materials Processing Microelectronics Doping Inspection Laser Direct Imaging (LDI) Thin Film Scribing Semiconductor Solar Cell/Panel wafer Mask PC Board Memory Photopolymer FPD --> Features & Benefits Paladin Advanced 355 is the flagship…

Azure Laser

Azure Laser

…Applications Application Process Laser Inspection Wafer and Reticle Inspection Fiber Bragg Grating semiconductor inspection --> CW Deep UV Lasers for Semiconductor Inspection - Easy integration into industrial environments Ideal for next-generation semiconductor inspection techniques, disc mastering…

Paladin Compact 355 quasi-CW laser

Paladin Compact 355 quasi-CW laser

…Paladin Compact 355 2000 4000 Air Cooled Drawing Paladin Compact 355 Applications Process Material Doping Inspection Laser Direct Imaging (LDI) Thin Film Scribing Semiconductor Solar Cell/Panel wafer Mask PC Board Memory Photopolymer FPD --> Features & Benefits Paladin Compact 355 comes in power…

COHR WP OPSL No Green Noise final 5.15.18.pdf

COHR WP OPSL No Green Noise final 5.15.18.pdf

…visible and ultraviolet applications for CW lasers (e.g., pumping CEP-stabilized laser systems, Brillouin scattering, and semiconductor wafer inspection) need a high quality stable output beam with low amplitude noise. Diode pumped solid state (DPSS) lasers can produce the requisite beam quality,…

32311a coverSinglesRR.indd

32311a coverSinglesRR.indd

…decreased 9% for fiscal 2015, but were
higher in the fourth quarter of fiscal 2015 compared to the prior quarter due to increases in wafer
inspection applications. Service orders remain strong due to high utilization rates in most fabs and
orders for new equipment are tied to specific…

34706a cover.indd

34706a cover.indd

…fiscal 2016 and were 26%
higher in the fourth quarter of fiscal 2016 compared to the third quarter of fiscal 2016 due to increases
in wafer inspection (investments for mobile logic chips) and ink jet nozzle printing applications. Service
orders and shipments remain strong due to high…

Microsoft Word - HECLs demonstrate high power and narrow spectral linewidth.doc

Microsoft Word - HECLs demonstrate high power and narrow spectral linewidth.doc

…and inspection are routinely providing consistently high quality
component parts with small variance of wavelength, spectral bandwidth and reflectivity both within a lot and from lot to
lot.3 The high degree of uniformity of both wavelength and efficiency (reflectivity) across a wafer