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1 diffraction. This technique has been employed for nanolithography [2], ablation [3], material etching [4] and for local reduction of oxides [5]. Its main disadvantage is the low throughput that can be achieved in a fabrication process, even when bundles of fibers are used. Presently, we are investigating ...
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pdf_126
(PAGE 10 OF 12)
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... range from about 0.1 mJ/ cm2/pulse down to just a few J/cm2/pulse (Fig. 1). This system uses a 2 kHz broadband ArF laser (Lambda-Physik NovaLine A2030) to expose the samples. The exposure and measurement system handles up to 20 samples at a time, exposing them to different fluences and measuring the ...
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