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delmdahl

Industrial Laser Solutions - September/October 2015

Industrial Laser Solutions - September/October 2015

…in advanced packaging of microelectronics by enabling structuring processes that are greener while delivering superior results. DR. RALPH DELMDAHL (ralph.delmdahl@coherent. com) is a product marketing manager at Coherent Laser Systems GmbH, Göttingen, Germany, www.coherent. com, and MATTHEW…

Industrial Laser Solutions - September/October 2015

Industrial Laser Solutions - September/October 2015

…in advanced packaging of microelectronics by enabling structuring processes that are greener while delivering superior results. DR. RALPH DELMDAHL (ralph.delmdahl@coherent. com) is a product marketing manager at Coherent Laser Systems GmbH, Göttingen, Germany, www.coherent. com, and MATTHEW…

Laser Focus World - February 2016

Laser Focus World - February 2016

…production FBGs while also delivering the unit-to-unit consistency critical to their successful use in sensing and other applications. Ralph Delmdahl is product marketing manager at Coherent, Santa Clara CA; e-mail: ralph.delmdahl@coherent.com; www.coherent.com. Kristian Buchwald is vice president…

Proofing-of-photolithographic-phase-shift-masks.pdf

Proofing-of-photolithographic-phase-shift-masks.pdf

UTE BUTTGEREIT RALPH DELMDAHL T he current 65 nm feature size is already well below the traditional diffraction limit for the exposure wavelength of 193 nm that is used in the photolithographic fabrication process. Producing such small features requires the use of a number of very clever techniques…

Excimer laser technology trends

Excimer laser technology trends

J. Phys. D: Appl. Phys. 47 (2014) 034004 R Delmdahl and R P¨atzel Figure 5. Consecutive high pulse frequency burst at 100 Hz with 5 s burst pause. 1 10 100 1000 10000 1970 1975 1980 1985 1990 1995 2000 2005 2010 2015 Power/Watt year Laser Power Roadmap commercial excimer laser Figure 6. Output power…

Excimer LLO 2014.pdf

Excimer LLO 2014.pdf

2 R. Delmdahl et al. Figure 1. Fabrication scheme of flexible displays by means of excimer LLO. Figure 2. Schematics of the LLO characteristics using short and long wavelengths. about 100 nm, with the typical polymer layer thicknesses extending from some ten to some hundred micrometers [5]. As a…

FutureElectronics June2014.pdf

FutureElectronics June2014.pdf

…and tablets. We look at an enabling technology to mass manufacture industrial-grade LTPS backplanes on large substrate panels. by Dr. Ralph Delmdahl Coherent I n the digital age, our informationand knowledge society relies heavily on mobile display devices, which have become nothing less than…

Proofing-of-photolithographic-phase-shift-masks.pdf

Proofing-of-photolithographic-phase-shift-masks.pdf

UTE BUTTGEREIT RALPH DELMDAHL T he current 65 nm feature size is already well below the traditional diffraction limit for the exposure wavelength of 193 nm that is used in the photolithographic fabrication process. Producing such small features requires the use of a number of very clever techniques…

Excimer laser technology trends

Excimer laser technology trends

J. Phys. D: Appl. Phys. 47 (2014) 034004 R Delmdahl and R P¨atzel Figure 5. Consecutive high pulse frequency burst at 100 Hz with 5 s burst pause. 1 10 100 1000 10000 1970 1975 1980 1985 1990 1995 2000 2005 2010 2015 Power/Watt year Laser Power Roadmap commercial excimer laser Figure 6. Output power…

Excimer LLO 2014.pdf

Excimer LLO 2014.pdf

2 R. Delmdahl et al. Figure 1. Fabrication scheme of flexible displays by means of excimer LLO. Figure 2. Schematics of the LLO characteristics using short and long wavelengths. about 100 nm, with the typical polymer layer thicknesses extending from some ten to some hundred micrometers [5]. As a…

FutureElectronics June2014.pdf

FutureElectronics June2014.pdf

…and tablets. We look at an enabling technology to mass manufacture industrial-grade LTPS backplanes on large substrate panels. by Dr. Ralph Delmdahl Coherent I n the digital age, our informationand knowledge society relies heavily on mobile display devices, which have become nothing less than…

Proofing-of-photolithographic-phase-shift-masks.pdf

Proofing-of-photolithographic-phase-shift-masks.pdf

UTE BUTTGEREIT RALPH DELMDAHL T he current 65 nm feature size is already well below the traditional diffraction limit for the exposure wavelength of 193 nm that is used in the photolithographic fabrication process. Producing such small features requires the use of a number of very clever techniques…

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