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ela

LineBeam

LineBeam

LineBeam System for excimer laser crystallization annealing applications. LineBeam for Excimer Laser Annealing (ELA) of typically 50 nm to 120 nm thick amorphous silicon films on large flat panel display glass substrates was transferred into industrial production in the mid-1990s. This technique is…

LAMBDA SX

LAMBDA SX

…is available from 300 Watts (248 nm and 308 nm) to 600 Watts (308 nm only). The LAMBDA SX lasers are perfectly suited for Excimer Laser Annealing (ELA), industrial scale Pulsed Laser Deposition (PLD), Laser Lift-Off (LLO), micro structuring, and all other applications which require high UV laser…

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