1 - 10 of 36 Search Results for euv
|
|
|
3.
DUV Microlithography
|
|
... lasers with 2 kHz or 4 kHz repetition rate operation and up to 20 W of output power, enabling optical lithography down to 50 nm. XTREME technologies EUV Sources In the year 2009, semiconductor chips with significantly improved computation and storage capabilities for new computer generations will have ...
Related Searches: novaline | ultraviolet
|
|
|
|
4.
pdf_148
(PAGE 1 OF 12)
|
|
|
1 absorb most of the EUV light. The whole optical system requires high vacuum to provide sufficient transparency. Grazing incidence optics and special multi-layer coated mirrors are the only usable optical components for EUV light. Plasma EUV light sources are broadband emitters from the IR to the ...
|
|
|
|
|
5.
GlobalSemiArt2Rev2
(PAGE 2 OF 2)
|
|
... Production Technology Node Application 2004 90 nm 2007 65 nm 2010 45 nm Lithography Excimer: 248 nm Excimer: 193 nm Excimer: 193 nm Excimer: 193 nm EUV 13.4 nm Photomask Writing Excimer: 248 nm Frequency doubled ion: 257 nm Excimer: 193 nm Frequency doubled ion: 257 nm Excimer: 193 nm Frequency mixed ...
Related Searches: 532 nm
|
|
|
|
|
6.
pdf_148
(PAGE 2 OF 12)
|
|
|
... with a picture of the spectrograph. This spectrum, and the results shown in figures 1,3,4, and 5, have been obtained with the commercial laboratory EUV source built by AIXUV GmbH. This EUV source is based on the Hollow Cathode Triggered (HCT) pinch design and operates at a 50 Hz repetition rate, emitting ...
|
|
|
|
|
7.
pdf_148
(PAGE 3 OF 12)
|
|
|
3 Differing from the spectral distribution of the emission, the horizontal positional distributions are nearly stable versus time for the EUV source mentioned above on the shown time scale. But there are indications that these parameters will change during long-term (days, weeks) operation of EUV sources ...
|
|
|
|
|
8.
pdf_148
(PAGE 4 OF 12)
|
|
|
4 cooperation partners. The reflectance of multilayer mirrors is measured with a relative uncertainty of 0.14% in the EUV spectral range. The reproducibility of the measurements is about 0.07%. The reflectance is measured in a sequential way, measuring the incident and the reflected beam. Fig. 1 illustrates ...
|
|
|
|
|
9.
pdf_148
(PAGE 5 OF 12)
|
|
|
... and comparison of such different sources, wellcharacterized detector systems are needed. PTB has developed high-accuracy detector calibration in the EUV spectral range, using a cryogenic electrical substitution radiometer as a primary detector standard in combination with monochromatized synchrotron ...
|
|
|
|
|
10.
ACF268A
(PAGE 5 OF 92)
|
|
|
... litho laser for material testing. We are also involved with Xtreme Technologies, a joint venture between Lambda Physik and Jenoptik AG, to produce EUV light sources capable of handling feature sizes of 35 nanometers. In September 2002, Xtreme Technologies received its first order for EUV light sources ...
|
|
Coherent Contact Information