1 - 10 of 25 Search Results for fluorine
|
|
|
1.
Semiconductor Manufacturing with Eximer Lasers
|
|
... the capability of optical lithography as light source for illumination and inspection. Summary From wavelengths KrF 248 nm, ArF 193 nm down to the fluorine version F2 at 157nm, for each generation of lithography systems the excimer laser is the tool for extension. The Excistarâ„¢ S-Industrial is designed ...
Related Searches: excimer laser
|
|
|
|
4.
ExcimersPushMachingLimitsforResolutionRev2
(PAGE 1 OF 3)
|
|
... laser material processing. Because of their unique physical properties that provide an essential advantage in both of these fields of application, fluorine (F2) laser sources play a key role in pushing the limits toward higher resolution and precise and efficient machining of new materials. Deep-ultraviolet ...
Related Searches: beam homogenizer
|
|
|
|
|
5.
ExcimersPushMachingLimitsforResolutionRev2
(PAGE 3 OF 3)
|
|
|
... "zero-defect" master template that can be used for mass production v ia consecutive electroforming and injection-molding production steps. Fluorine lasers represent the ideal tools to create the complex arrangement of microfluidic channels and cavities contained in these master templates with ...
|
|
|
|
|
6.
ExcimerProductGuide2008
(PAGE 30 OF 48)
|
|
... refer to the laser specifications. Gas Supply The active medium of an excimer laser is a mixture of a rare gas (argon, krypton or xenon), a halogen (fluorine or hydrogen chloride), and a buffer gas (helium or neon). In addition to the premixed gas, another gas (in most cases, nitrogen) is needed to ...
Related Searches: argon krypton
|
|
|
|
|
7.
pdf_127
(PAGE 1 OF 12)
|
|
... of potential applications. see article on page 1 Three new laser lines have been discovered around 157 nm by dispersing the output of a molecular fluorine (F2) laser. The lines were measured with a high-resolution spectrograph at the National Institute of Standards & Technology (NIST) to an accuracy ...
Related Searches: geolas
|
|
|
|
|
9.
pdf_127
(PAGE 4 OF 12)
|
|
|
... No. 58 In the near future, production of integrated circuits for computer chips is expected to utilize microlithography based on a molecular fluorine (F2) laser operating at a wavelength of 157 nm. This is referred to as deep ultraviolet (DUV) lithography. According to the International Technology Roadmap ...
|
|
|
|
|
10.
Excimer_Product_Guide_2008
(PAGE 30 OF 48)
|
|
|
... refer to the laser specifications. Gas Supply The active medium of an excimer laser is a mixture of a rare gas (argon, krypton or xenon), a halogen (fluorine or hydrogen chloride), and a buffer gas (helium or neon). In addition to the premixed gas, another gas (in most cases, nitrogen) is needed to ...
|
|
Coherent Contact Information