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1 - 10 of 12 Search Results for heidelberg
Search Suggestions: 405nm laser | tropel | lens | 543nm laser | beam shaper | vuv | pure 20 | tripled | dye laser | co2 tea

1pdf document  AnalyticalArticleRev2 Best match in this PDF  |  All matches in this PDF
A dvances in laser-based analytical instrumentation have finally begun to catch up with advances in microprocessor technology and consumer electronic devices. Although faster, smaller and more-ergonomic devices permeate our personal lives, until recently users of laser-based analytical tools toiled ...
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2pdf document  pdf_126 Best match in this PDF  |  All matches in this PDF
1 diffraction. This technique has been employed for nanolithography [2], ablation [3], material etching [4] and for local reduction of oxides [5]. Its main disadvantage is the low throughput that can be achieved in a fabrication process, even when bundles of fibers are used. Presently, we are investigating ...
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3pdf document  pdf_129 Best match in this PDF  |  All matches in this PDF
... . Andreas Ostendorf of the Laser Zentrum Hannover described the micromachining of PTFE and fused silica, while Peter Hess of the University of Heidelberg discussed studies of the photodesorption of hydrogen from a silicon surface. The latter work could be applied to resistless photolithography by patterning ...
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4pdf document  pdf_130 Best match in this PDF  |  All matches in this PDF
The experimental arrangement is shown in Fig. 1: The beam of a laboratory-constructed excimer laser, operated as a F2 laser, propagated via a gas-tight tube into the processing chamber, both evacuated to 10-5 Torr and subsequently flushed with several Torr of Ar gas to allow for VUV transparency. A ...
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5pdf document  pdf_128 Best match in this PDF  |  All matches in this PDF
With a Gaussian power distribution and a beam quality factor of M2 =1.1, the laser beam can be used for nearly diffraction-limited resolution. A pulse peak power in the gigawatt range can be achieved on the sample, using a Lambda Physik DPSS laser with pulse energies in the range of 10 mJ at pulse ...
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6pdf document  pdf_129  (PAGE 1 OF 8)
... . Andreas Ostendorf of the Laser Zentrum Hannover described the micromachining of PTFE and fused silica, while Peter Hess of the University of Heidelberg discussed studies of the photodesorption of hydrogen from a silicon surface. The latter work could be applied to resistless photolithography by patterning ...

7pdf document  pdf_126  (PAGE 7 OF 12)
... (1 ×1):H Digitally Controlled F2-Laser Oxidation of H-Terminated Silicon Jochen Lambers and Peter Hess, Institute of Physical Chemistry University of Heidelberg, Germany Fig. 1: Experimental setup with the F2-laser beam and the IR beam of the FTIR spectrometer traversing the UHV chamber that contains ...

8pdf document  pdf_126  (PAGE 9 OF 12)
... support of this work by Heidelberger Druckmaschinen AG is gratefully acknowledged. Peter Hess Institute of Physical Chemistry University of Heidelberg Im Neuenheimer Feld 253 69120 Heidelberg, Germany Email: peter.hess@urz.uni-heidelberg.de References [1] Fundamental Aspects of Silicon Oxidation, Y ...

9pdf document  pdf_129  (PAGE 5 OF 8)
... , P. Hess, Phys.Rev.Lett. 81 (1998) 645 [3] A. Pusel, P. Hess, Surf.Sci. 433-435 (1999) 74 Peter Hess Institute of Physical Chemistry University of Heidelberg, Germany

10pdf document  AnalyticalArticleRev2  (PAGE 5 OF 5)
... same customer demands as manufacturers of other analytical instruments: smaller, more economical and easier-to-use instruments. Leica Microsystems Heidelberg GmbH of Mannheim, Germany, which makes confocal microscopes, discovered that, for some applications, near-UV solid-state lasers offer the combination ...
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