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1 - 10 of 10 Search Results for schwarzschild
Search Suggestions: microvia | lpx 200 | homogenizer | beam homogenizer | 193 nm laser | fused silica | microlas | basting | thin film | trench

1pdf document  ExcimersPushMachingLimitsforResolutionRev2  (PAGE 2 OF 3)
... attenuation, cylindrical lens arrays expand and homogenize the beam for uniform illumination of the mask at the desired laser fluence. Using a Schwarzschild objective with 25 × magnification, the illuminated mask is imaged onto the sample located on precision stages. The whole system is surrounded by ...

2pdf document  702_TuiLaser_Reprint Best match in this PDF  |  All matches in this PDF
... to homogenize the beam from a Lambda Physik LPF 220i F2 laser and to focus it on a 6 6-mm aperture for uniform illumination at the mask plane. A 25 Schwarzschild lens delivered uniform ±5 percent on-target fluence of 6 J/cm2 in a 0.25 mm 0.25-mm field. The system extends the possibilities for fabricating ...
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3pdf document  pdf_119 Best match in this PDF  |  All matches in this PDF
1 A PUBLICATION BY LAMBDA PHYSIK · JANUARY 2002 · No. 59 LAMBDA HIGHLIGHTS crystal or near-single-crystal silicon films that cannot be produced by the line beam method. However, James Im at Columbia University (New York, NY) has developed a new process called excimer laser-based sequential lateral ...
Related Searches: lpx 200 | homogenizer | basting | thin film

4pdf document  ExcimersPushMachingLimitsforResolutionRev2 Best match in this PDF  |  All matches in this PDF
... × 22-mm field Homogenizer Enclosure: inert gas flow Dielectric attenuator Prism expander VUV fluorescent window Field lens Mask field 5 × 5 mm 25 X Schwarzschild Sample alignment system Nozzle Sample Excimers find their niche As diode lasers continue to grow rapidly in functional as well as commercial ...
Related Searches: beam homogenizer | 193 nm laser | fused silica | microlas

5pdf document  OLEreprintCOHERENTJul07 Best match in this PDF  |  All matches in this PDF
... -speed,economicalfabricationofnanostructuresoverlarge sample areas, we have also developed an irradiation setup based on a homemade Schwarzschild-type reflecting objective. Thisdeviceprovidesafieldsizeupto1mm2 , a numerical aperture of at least 0.25 and a demagnification of 15-30. This entire optical ...
Related Searches: excimer polarization | schwarzschild objective | lpx 200

6pdf document  OLEreprintCOHERENTJul07  (PAGE 2 OF 2)
... high-speed, economical fabrication of nanostructures over large sample areas, we have also developed an irradiation setup based on a homemade Schwarzschild-type reflecting objective. This device provides a field size up to 1 mm2, a numerical aperture of at least 0.25 and a demagnification of 15-30. ...

7pdf document  ExcimersPushMachingLimitsforResolutionRev2  (PAGE 1 OF 3)
... × 22-mm field Homogenizer Enclosure: inert gas flow Dielectric attenuator Prism expander VUV fluorescent window Field lens Mask field 5 × 5 mm 25 X Schwarzschild Sample alignment system Nozzle Sample Excimers find their niche As diode lasers continue to grow rapidly in functional as well as commercial ...
Related Searches: beam homogenizer

8pdf document  pdf_119  (PAGE 11 OF 12)
... in the planar polymer waveguides of thicknesses of around 600 nm: Direct illumination of a grating phase mask and imaging of a grating mask by a Schwarzschild objective. Both methods use the two first diffraction orders of the grating to interfere on the polymer surface while the zero order signal is ...

9pdf document  pdf_119  (PAGE 12 OF 12)
... Lambda Highlights No. 59 ures. Grating areas in the range of square millimeters and even square centimeters are possible, whereas gratings made by a Schwarzschild objective are limited to areas of a few hundred square micrometers in the best case. However, the requirements for the beam profile are more ...
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10pdf document  702_TuiLaser_Reprint  (PAGE 4 OF 4)
... to homogenize the beam from a Lambda Physik LPF 220i F2 laser and to focus it on a 6 6-mm aperture for uniform illumination at the mask plane. A 25 Schwarzschild lens delivered uniform ±5 percent on-target fluence of 6 J/cm2 in a 0.25 mm 0.25-mm field. The system extends the possibilities for fabricating ...


Search Suggestions: microvia | lpx 200 | homogenizer | beam homogenizer | 193 nm laser | fused silica | microlas | basting | thin film | trench


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